Deformation of New Photo-Spacer for TFT-LCD

YU Tao; CHEN Sheng; CHU Pei-ming; ZHENG Yong-liang; SHEN Jian-feng

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Deformation of New Photo-Spacer for TFT-LCD

Material Physics & Chemistry | 更新时间：2020-08-12

- Deformation of New Photo-Spacer for TFT-LCD
- Chinese Journal of Liquid Crystals and Displays Vol. 27, Issue 4, Pages: 445-447(2012)
- 作者机构：
  
  1. 中国科学院上海高等研究院新型显示技术研究中心上海,201203
  2. 上海中科联和显示技术有限公司上海,201203
- 作者简介：
- 基金信息：
- DOI：
  CLC： 0631.2;TN141.9
- Received：21 March 2012，
  
  Revised：19 April 2012，
  
  Published Online：15 August 2012，
  
  Published：15 August 2012
- 稿件说明：
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于涛, 陈晟, 储培鸣, 郑永亮, 申剑锋. 新型TFT-LCD柱状隔垫物的形变研究[J]. 液晶与显示, 2012,(4): 445-447

YU Tao, CHEN Sheng, CHU Pei-ming, ZHENG Yong-liang, SHEN Jian-feng. Deformation of New Photo-Spacer for TFT-LCD[J]. , 2012,(4): 445-447
于涛, 陈晟, 储培鸣, 郑永亮, 申剑锋. 新型TFT-LCD柱状隔垫物的形变研究[J]. 液晶与显示, 2012,(4): 445-447 DOI：

YU Tao, CHEN Sheng, CHU Pei-ming, ZHENG Yong-liang, SHEN Jian-feng. Deformation of New Photo-Spacer for TFT-LCD[J]. , 2012,(4): 445-447 DOI：

摘要

介绍了一种可应用于大尺寸TFT-LCD的新型柱状隔垫物(photo-spacer)材料。与已经量产的材料相比

该材料具有更高的弹性恢复率和外压形变承受能力。在相同生产条件下的对比实验显示

该材料经过230℃加热20 min柱高的缩小率为3.04%

具有较好的热稳定性。机械性能评价结果显示

摩擦压力对于Spacer柱高没有太大的影响。

Abstract

A new photo-spacer applied in TFT-LCD production was introduced. This material not only could withstand greater deformation

but had a higher recovery rate than other material. Compared with the mass production material

it showed better heat tolerance at 230℃ for 20 min and its height reduction ratio was 3.04%. It also showed little dependent on column Spacer height in rubbing processes under the same production condition.

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references

程石, 王涛, 张敏, 等. TFT-LCD中隔垫物密度与Push Mura和低温气泡的关系 [J]. 液晶与显示, 2011, 26(5):604-607.

Chen S H, Koo H S, Chen W Y, et al. Advanced photo spacer technology for large-sized TFT-LCD //SID Symposium Digest, Boston:SID, 2005, 36: 539-541.

Cho Jung-Hyuk, Sohn Jung-Min. Improvement of column spacer uniformity in a TFT LCD panel [J]. J. Korean Physical Society, 2006, 48(2):240-245.

Koo H S, Kang C H. Study on physical properties of organic resist spacers on color filters //Microprocesses and Nanotechnology, 2007 Digest of Papers, Kyoto:The Japan Society of Applied Physics and IEEE Electron Device Society,2007: 98-99.

Li De-Jiun, Huang Chun-Ming, Chou Kuo-Ching. Deformation Analysis on the Photospacers for TFT LCD //Proc. of ASID06, New Delhi:SID, 2006: 19-22.

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