New Spectrometric Instrument for X-Ray Luminescence Materials Observation

REN Xin-guang; LUO Jin-shong

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New Spectrometric Instrument for X-Ray Luminescence Materials Observation

Material Physics & Chemistry | 更新时间：2020-08-12

- New Spectrometric Instrument for X-Ray Luminescence Materials Observation
- Chinese Journal of Liquid Crystals and Displays Vol. 24, Issue 6, Pages: 809-811(2009)
- 作者机构：
  
  中国科学院长春光学精密机械与物理研究所激发态物理重点实验室,吉林长春,130033
- 作者简介：
- 基金信息：
- DOI：
  CLC： O657.34;TH744.16
- Received：07 June 2009，
  
  Revised：02 January 1900，
  
  Published Online：30 December 2009，
  
  Published：30 December 2009
- 稿件说明：
移动端阅览
任新光;罗劲松. 一种新的X-射线发光光谱测量装置的建立[J]. 液晶与显示, 2009,24(6): 809-811

REN Xin-guang;LUO Jin-shong. New Spectrometric Instrument for X-Ray Luminescence Materials Observation[J]. 液晶与显示, 2009,24(6): 809-811
任新光;罗劲松. 一种新的X-射线发光光谱测量装置的建立[J]. 液晶与显示, 2009,24(6): 809-811 DOI：

REN Xin-guang;LUO Jin-shong. New Spectrometric Instrument for X-Ray Luminescence Materials Observation[J]. 液晶与显示, 2009,24(6): 809-811 DOI：

摘要

提出一种由X-射线发生器、光学光纤、荧光光谱仪组成的用于测定X-射线发光材料的新装置。该设备可以测定X-射线发光材料的荧光强度随着波长的变化曲线、荧光强度随着激发时间的变化曲线、余辉衰减随着时间的变化曲线以及余辉时间等。研究了X射线发光材料在不同时间段的光谱特征。

Abstract

A new instrument for X-ray luminescence spectrum was established in order to study properties of X-ray luminescence materials

which consists of X-ray generator

optical fiber and fluorescence spectrophotometer and can determine spectral distribution graph

time-change graph

afterglow decay curve. The results showed that both of stability and precision are fine and relative standard deviation(RSD)is less more than 2%. The instrument simplifies the process for determining X-ray luminescence materials.

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references

. 徐叙瑢,苏勉曾. 发光学与发光材料 [M].北京:化学工业出版社,2004.

. Schweizer S. Physics and current understanding of X-ray storage phosphors [J]. Phys. Stat. Sol. (A), 2001, 187:335-393.

. 夏上达.稀土发光和光谱理论的研究进展 [J]. 发光学报 ,2007,28(4):465-478.

. 杨志平, 赵金鑫, 李小宁,等. X射线增感屏用纳米CaWO4的Pechini溶胶-凝胶法制备及其光学性能[J]. 发光学报 ,2008,29(2):279-282.

. 任新光. 电弧法SrAl2O4 : Eu2+长余挥发光陶瓷的制备及其光谱分析 [J]. 光谱学与光谱分析 ,2000,20(3):268-269.

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