Fabrication of ZnO:Zr Film Deposited on Flexible Substrate by RF Magnetron Sputtering

LIU Han-fa; ZHANG Hua-fu; LEI Cheng-xin; YUAN Yu-zhen; YUAN Chang-kun

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Fabrication of ZnO:Zr Film Deposited on Flexible Substrate by RF Magnetron Sputtering

Device Technology & Physics | 更新时间：2020-08-12

- Fabrication of ZnO:Zr Film Deposited on Flexible Substrate by RF Magnetron Sputtering
- Chinese Journal of Liquid Crystals and Displays Vol. 24, Issue 2, Pages: 183-186(2009)
- 作者机构：
  
  山东理工大学物理与光电信息技术学院,山东淄博,255049
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN305.3
- Received：04 September 2008，
  
  Revised：24 October 2008，
  
  Published Online：30 April 2009，
  
  Published：30 April 2009
- 稿件说明：
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刘汉法;张化福;类成新;袁玉珍;袁长坤. 利用射频磁控溅射法在柔性衬底上制备ZnO:Zr透明导电薄膜[J]. 液晶与显示, 2009,24(2): 183-186

LIU Han-fa;ZHANG Hua-fu;LEI Cheng-xin;YUAN Yu-zhen;YUAN Chang-kun. Fabrication of ZnO:Zr Film Deposited on Flexible Substrate by RF Magnetron Sputtering[J]. 液晶与显示, 2009,24(2): 183-186
刘汉法;张化福;类成新;袁玉珍;袁长坤. 利用射频磁控溅射法在柔性衬底上制备ZnO:Zr透明导电薄膜[J]. 液晶与显示, 2009,24(2): 183-186 DOI：

LIU Han-fa;ZHANG Hua-fu;LEI Cheng-xin;YUAN Yu-zhen;YUAN Chang-kun. Fabrication of ZnO:Zr Film Deposited on Flexible Substrate by RF Magnetron Sputtering[J]. 液晶与显示, 2009,24(2): 183-186 DOI：

摘要

利用射频磁控溅射法首次在室温水冷柔性衬底 PET上制备出了可见光透过率高、电阻率低的掺锆氧化锌(ZnO : Zr)透明导电薄膜。X射线衍射和扫描电子显微镜表明，ZnO : Zr薄膜为六角纤锌矿结构的多晶薄膜，且具有平行于衬底方向的择优取向。实验获得ZnO : Zr薄膜的最小电阻率为1.55×10

-3

Ω·cm。实验制备的ZnO : Zr薄膜具有良好的附着性能，其可见光区平均透过率超过90％。

Abstract

Zirconium-doped zinc oxide (ZnO : Zr) transparent conducting thin films with high transmittance

low resistivity and good adhesion were firstly prepared on water-cooled polyethylene glycol terephthalate flexible substrates by RF magnetron sputtering. X-ray diffraction and scanning electron microscopy show that the ZnO : Zr films are polycrystalline with a hexagonal structure and a preferred orientation parallel to the substrate. The lowest resistivity obtained in our experiment is 1.55×10

-3

Ω·cm. The average transmittance of the films is over 90% in the wavelength range of the visible spectrum.

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Keywords

references

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Fang G J, Li D J, Yao B L. Influence of post-deposition annealing on the properties of transparent conductive nanocrystalline ZAO thin films prepared by RF magnetron sputtering with highly conductive ceramic target [J]. Thin Solid Films, 2002, 418(2):156-162.

Suchea M, Christoulakis S, Katsarakis N, et al. Comparative study of zinc oxide and aluminum doped zinc oxide transparent thin films grown by direct current magnetron sputtering [J]. Thin Solid Films,2007, 515(16): 6562-6566.

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Related Author

GUO Mei-xia

LIU Han-fa

ZHANG Hua-fu

YUAN Yu-zhen

YUAN Chang-kun

LEI Cheng-xin

YUAN Chang-kun

LIU Han-fa

Related Institution

School of Science, Shandong University of Technology

School of Science, Shandong University of Technology, Zibo 255049, China,E-mail:liuhanfa@126.

School of Physics and Optic-Electronic Information, Shandong University of Technology, Zibo 255049, China, E-mail:huabaozhang@126.

Jilin Normal University

Key Laboratory for Comprehensive Energy Saving of Cold Regions Architecture of Ministry of Education, Jilin Jianzhu University

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