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Key influencing factors of silicon nitride thin film deposition in polarizer bleaching issue
Device Physics and Device Preparation | 更新时间：2025-12-24

    • Key influencing factors of silicon nitride thin film deposition in polarizer bleaching issue

    • “In the field of flexible organic light-emitting diodes, experts have revealed the influence mechanism of RF power and electrode spacing on the fading behavior of polarizers through full factor experimental design, providing a solution to improve the reliability of equipment in humid and hot environments.”
    • Chinese Journal of Liquid Crystals and Displays   Vol. 40, Issue 12, Pages: 1800-1809(2025)

    • DOI：10.37188/CJLCD.2025-0200    

      CLC： TN27;TB79
    • CSTR：32172.14.CJLCD.2025-0200    

    • Received：25 September 2025，

      Revised：2025-10-22，

      Published：05 December 2025

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  • WANG Zhiqiang, TAN Yaohong, SUN Wen, et al. Key influencing factors of silicon nitride thin film deposition in polarizer bleaching issue[J]. Chinese Journal of Liquid Crystals and Displays, 2025, 40(12): 1800-1809. DOI： 10.37188/CJLCD.2025-0200. CSTR： 32172.14.CJLCD.2025-0200.

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